Line, point and surface defect morphology of graded, relaxed GeSi alloys on Si substrates
- 1 February 1997
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 294 (1-2) , 3-10
- https://doi.org/10.1016/s0040-6090(96)09296-6
Abstract
No abstract availableKeywords
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