Characteristics of rutile TiO2 films prepared by r.f. magnetron sputtering at a low temperature
- 1 August 1996
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 281-282, 427-430
- https://doi.org/10.1016/0040-6090(96)08659-2
Abstract
No abstract availableKeywords
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