Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
- 1 July 2002
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 20 (4) , 1321-1326
- https://doi.org/10.1116/1.1486233
Abstract
No abstract availableThis publication has 18 references indexed in Scilit:
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