Ion projection lithography below 70 nm: tool performance and resist process
- 31 July 2002
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 61-62, 301-307
- https://doi.org/10.1016/s0167-9317(02)00529-4
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- Ion projection lithography: status of tool and mask developmentsMicroelectronic Engineering, 2001
- Resist process development for sub-100-nm ion projection lithographyMicroelectronic Engineering, 2001
- Determination of resist exposure parameters in helium ion beam lithography: Absorbed energy gradient, contrast, and critical doseJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2000
- Measuring acid generation efficiency in chemically amplified resists with all three beamsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1999