Preparation of VO_2 thin film and its direct optical bit recording characteristics
- 15 January 1983
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 22 (2) , 265-268
- https://doi.org/10.1364/ao.22.000265
Abstract
Optics InfoBase is the Optical Society's online library for flagship journals, partnered and copublished journals, and recent proceedings from OSA conferences.Keywords
This publication has 12 references indexed in Scilit:
- High-density optical recording with (Ga,Al)As DH lasersApplied Physics Letters, 1979
- Self-coupled optical pickupOptics Communications, 1976
- Behavior of vanadium dioxide single crystals synthesized under the various oxygen partial pressures at 1500 KJournal of Solid State Chemistry, 1974
- Optical storage in VO2 filmsApplied Physics Letters, 1973
- Magnetic, electrical and thermal studies on the
V Mo Materials Research Bulletin, 1973 - Contribution to the study of the metal-insulator transition in the V1−xNbxO2 system: I — crystallographic and transport propertiesJournal of Physics and Chemistry of Solids, 1972
- R.F. and D.C. reactive sputtering for crystalline and amorphous VO2 thin film depositionThin Solid Films, 1972
- Holographic Storage in VO2Applied Physics Letters, 1971
- A D.T.A. study of the semiconductor-metallic transition temperature in
V x W x O x ≤ 0.067Materials Research Bulletin, 1969 - REACTIVELY SPUTTERED VANADIUM DIOXIDE THIN FILMSApplied Physics Letters, 1967