GaxIn1−xP liquid phase epitaxial growth on (100) GaAs substrates

Abstract
We have performed Gax In1−xP liquid phase epitaxial (LPE) growth on (100) GaAs substrates at a growth temperature of 785 °C. The P atom fraction in the growth melts was kept constant every LPE growth run. The lattice mismatch Δa/a0 between the Gax In1−xP layer and GaAs substrate normal to the wafer surface and photoluminescence (PL) of the alloy layer were measured. It was found that Δa/a0 and the PL peak energy vary linearly from +0.47 to −0.13% and from 1.869 to 1.921 eV at room temperature, depending on the Ga atom fraction in the growth melts, respectively. This means that the so‐called composition pulling phenomenon does not occur in LPE growth of Gax In1−xP on (100) GaAs substrates.