Nanoindentation of epitaxial GaN films
- 13 November 2000
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 77 (21) , 3373-3375
- https://doi.org/10.1063/1.1328047
Abstract
Wurtzite GaN films grown on sapphire substrates are studied by nanoindentation with a spherical indenter. No systematic dependence of the mechanical properties of GaN epilayers on the film thickness (at least for thicknesses from 1.8 to 4 μm) as well as on doping type is observed. Slip is identified as one of the physical mechanisms responsible for plastic deformation of GaN and may also contribute to the “pop-in” events observed during loading. No visible material cracking is found even after indentations at high loads (900 mN), but a pronounced elevation of the material surrounding the impression is observed.Keywords
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