Preparation of silicon carbide powders by chemical vapour deposition of the SiH4-CH4-H2 system
- 1 November 1989
- journal article
- research article
- Published by Springer Nature in Journal of Materials Science
- Vol. 24 (11) , 3824-3830
- https://doi.org/10.1007/bf01168942
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Thermoelectric energy conversion by porous SiC ceramicsJournal of Materials Science Letters, 1987
- Thin films-preparation, structure and properties. Thermodynamics for the chemical vapor deposition of SiCl4-TiCl4-CCl4-H2 system.NIPPON KAGAKU KAISHI, 1987
- CVD in-situ ceramic composites.Journal of the Society of Materials Science, Japan, 1987
- CVD Fabrication of In-situ Composites of Non-Oxide CeramicsPublished by Springer Nature ,1986
- The structure of chemical vapor deposited silicon carbideThin Solid Films, 1977
- Vapor-Phase Deposition of Beta-Silicon Carbide on Silicon SubstratesJournal of the Electrochemical Society, 1973
- Crystal Growth of Silicon Carbide by Vapor Phase Reaction at High TemperatureJournal of the Ceramic Association, Japan, 1967