The growth of ultra-thin amorphous WGex films on Si by the GeH4 reduction of WF6
- 1 November 1991
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 53, 47-53
- https://doi.org/10.1016/0169-4332(91)90241-b
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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