Comparative Study of the Stress in Chromium Films Deposited by Vacuum Arc Evaporation, Vacuum Evaporation, and DC Magnetron Sputtering
- 16 April 1996
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 154 (2) , 669-679
- https://doi.org/10.1002/pssa.2211540220
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Determination of mechanical properties of thin films: a theoretical feasibility studySurface and Coatings Technology, 1993
- Stress-related effects in thin filmsThin Solid Films, 1989
- Ion flux characteristics in arc vapor deposition of TiNSurface and Coatings Technology, 1988
- An Approximate Analysis of Stresses in Multilayered Elastic Thin FilmsJournal of Applied Mechanics, 1988
- Stresses in Bi-Metal ThermostatsJournal of Applied Mechanics, 1986
- Substrate heating rates for planar and cylindrical-post magnetron sputtering sourcesThin Solid Films, 1984