Deposition of Ga, Al and As Layers by Laser-Assisted Decomposition of Trimethylgallium, Trimethylaluminum and Arsine

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Abstract
We have investigated the substrate temperature dependence of deposition rates for Ga, Al and As layers formed on fused quartz (Suprasil) substrates by ArF excimer laser-assisted chemical vapor deposition using trimethylgallium, trimethylaluminum and arsine as source materials, respectively. The deposition rates for Ga and Al were independent of substrate temperature in the range from 100°C to 400°C, and then increased with substrate temperature above 400°C. On the other hand, the As deposition rate decreased dramatically with increasing substrate temperature up to 300°C. The result of As deposition can be explained qualitatively by three competing processes of the laser decomposition of arsine and laser and/or thermal desorptions of the As atom.