Hydrogenated aluminum nitride thin films prepared by r.f. reactive sputtering. Infrared and structural properties
- 1 September 1995
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 265 (1-2) , 15-21
- https://doi.org/10.1016/0040-6090(95)06605-5
Abstract
No abstract availableKeywords
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