Spectroscopic ellipsometric characterization of undoped ZnTe films grown on GaAs
- 3 February 1997
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 70 (5) , 610-612
- https://doi.org/10.1063/1.118289
Abstract
We report highly accurate dielectric function data for ZnTe. These data were made possible by the high quality of the heteroepitaxial material and the development of a chemical etching procedure for producing abrupt surfaces on ZnTe; they provided the first observation of the structure in ZnTe by spectroscopic ellipsometry and evidence for several contributions to the structure. Accurate critical point energies were obtained by Fourier analysis.
Keywords
This publication has 16 references indexed in Scilit:
- Optical properties of zinc-blende CdSe andSe films grown on GaAsPhysical Review B, 1994
- Optical characterization of pure ZnSe films grown on GaAsApplied Physics Letters, 1993
- Optical properties of ZnTeJournal of Applied Physics, 1993
- Numerical Derivative Analysis of the Pseudodielectric Functions of ZnTeJapanese Journal of Applied Physics, 1992
- interband transitions in As alloysPhysical Review B, 1990
- Nondestructive analysis of Hg1−xCdxTe (x=0.00, 0.20, 0.29, and 1.00) by spectroscopic ellipsometry. II. Substrate, oxide, and interface propertiesJournal of Vacuum Science & Technology A, 1984
- Nondestructive analysis of Hg1−xCdxTe (x=0.00, 0.20, 0.29, and 1.00) by spectroscopic ellipsometry. I. Chemical oxidation and etchingJournal of Vacuum Science & Technology A, 1984
- Chemical etching and cleaning procedures for Si, Ge, and some III-V compound semiconductorsApplied Physics Letters, 1981
- Dielectric function and surface microroughness measurements of InSb by spectroscopic ellipsometryJournal of Vacuum Science and Technology, 1980
- Smoothing and Differentiation of Data by Simplified Least Squares Procedures.Analytical Chemistry, 1964