Mix and match lithography for 0.1 μm MOSFET fabrication
- 1 March 1991
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 13 (1-4) , 189-192
- https://doi.org/10.1016/0167-9317(91)90074-n
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- High throughput electron lithography for integrated optoelectronic grating structuresMicroelectronic Engineering, 1990
- Patterning of 0.1 μm polysilicon lines by using a negative electron beam resistMicroelectronic Engineering, 1990
- Conductance fluctuations in ultra-short-channel Si MOSFETSSolid State Communications, 1987