A spectroscopic ellipsometry study of the nucleation and growth of plasma-deposited amorphous silicon
- 16 August 1985
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 130 (1-2) , 165-170
- https://doi.org/10.1016/0040-6090(85)90305-0
Abstract
No abstract availableKeywords
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