Effect of sample doping level during etching of silicon by fluorine atoms
- 15 July 1988
- journal article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 38 (3) , 2057-2062
- https://doi.org/10.1103/physrevb.38.2057
Abstract
No abstract availableThis publication has 13 references indexed in Scilit:
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