Investigation of SiO2 layers deposited by plasma decomposition of tetra-ethoxy silane in a planar reactor
- 16 August 1978
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 48 (2) , 609-614
- https://doi.org/10.1002/pssa.2210480243
Abstract
No abstract availableKeywords
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