70.4: A 14.1inch AMOLED Display using Highly Stable PECVD based Microcrystalline Silicon TFT Backplane
- 1 January 2006
- journal article
- Published by Wiley in SID Symposium Digest of Technical Papers
- Vol. 37 (1) , 1972-1975
- https://doi.org/10.1889/1.2433437
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- High-mobility nanocrystalline silicon thin-film transistors fabricated by plasma-enhanced chemical vapor depositionApplied Physics Letters, 2005
- 16.4: A 14.1ʺ WXGA Solution Processed OLED Display with a-Si TFTSID Symposium Digest of Technical Papers, 2005
- 57.1:Invited Paper:Comparison of a‐Si and Poly‐Si for AMOLEDsSID Symposium Digest of Technical Papers, 2004
- Investigation of grain boundary control in the drain junction on laser-crystalized poly-Si thin film transistorsIEEE Electron Device Letters, 2003
- Microcrystalline Silicon Thin-Films Grown by Plasma Enhanced Chemical Vapour Deposition - Growth Mechanisms and Grain Size ControlSolid State Phenomena, 2003
- 34.4: Invited Paper: Microcrystalline Silicon: An emerging Material for Stable Thin Film TransistorsSID Symposium Digest of Technical Papers, 2003
- Nanocrystalline silicon thin film transistorsIEE Proceedings - Circuits, Devices and Systems, 2003
- Microcrystalline silicon by plasma enhanced chemical vapor deposition from silicon tetrafluorideJournal of Vacuum Science & Technology A, 2001
- Stability of plasma deposited thin film transistors — comparison of amorphous and microcrystalline siliconThin Solid Films, 2001