Deposition of hard crystalline Al2O3 coatings by bipolar pulsed d.c. PACVD
- 1 October 1998
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 108-109, 257-264
- https://doi.org/10.1016/s0257-8972(98)00561-1
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Influence of coating parameters on the structure and properties of Al2O3 layers reactively deposited by means of pulsed magnetron sputteringPublished by Elsevier ,2001
- New PACVD-hard material layers for wear protection of high-speed steelSurface and Coatings Technology, 1997
- The deposition of hard crystalline Al2O3 layers by means of bipolar pulsed magnetron sputteringSurface and Coatings Technology, 1996
- Plasma chemical vapour deposition of aluminium oxide on hardmetalsInternational Journal of Refractory Metals and Hard Materials, 1996
- Effect of plasma activation on the phase transformations of aluminum oxideSurface and Coatings Technology, 1995
- Chemical vapour deposition of Al2O3 on TiOThin Solid Films, 1995
- Plasma-induced deposition of thin films of aluminum oxidePlasma Chemistry and Plasma Processing, 1992
- Formation of mixed TiC/Al2O3 layers and ?a- and ?-Al2O3 on cemented carbides by chemical vapour depositionJournal of Materials Science, 1989
- Preparation of alumina coatings by chemical vapour depositionThin Solid Films, 1986
- Transitions in Vapor‐Deposited Alumina from 300° to 1200°CJournal of the American Ceramic Society, 1967