The deposition of hard crystalline Al2O3 layers by means of bipolar pulsed magnetron sputtering
- 15 December 1996
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 86-87, 657-663
- https://doi.org/10.1016/s0257-8972(96)03075-7
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Effect of plasma activation on the phase transformations of aluminum oxideSurface and Coatings Technology, 1995
- Pulsed magnetron sputter technologySurface and Coatings Technology, 1993
- Phase transformation in chemically vapour-deposited κ-aluminaThin Solid Films, 1992
- A review of the present state of art in hard coatings grown from the vapor phaseJournal of Vacuum Science & Technology A, 1986
- Alumina deposition by activated reactive evaporationThin Solid Films, 1977
- Physical and Chemical Properties of Aluminum Oxide Film Deposited by AlCl3-CO2-H2SystemJapanese Journal of Applied Physics, 1972
- Transitions in Vapor‐Deposited Alumina from 300° to 1200°CJournal of the American Ceramic Society, 1967