Computer-generated holograms fabricated by direct write of positive electron-beam resist
- 15 February 1993
- journal article
- Published by Optica Publishing Group in Optics Letters
- Vol. 18 (4) , 308-310
- https://doi.org/10.1364/ol.18.000308
Abstract
An e-beam lithographic technique is described that produces multiple discrete phase levels as a surface-relief structure directly in positive e-beam resist. Processing techniques are presented for two positive e-beam resists: EBR-9 and polymethyl methacrylate (PMMA). This fabrication technology is experimentally applied to produce sawtooth (blazed) gratings and multiphase-level numeric-type computer-generated holograms (i.e., kinoforms).Keywords
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