Study of HfO2 films prepared by ion-assisted deposition using a gridless end-hall ion source
- 1 August 1999
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 350 (1-2) , 203-208
- https://doi.org/10.1016/s0040-6090(99)00226-6
Abstract
No abstract availableKeywords
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