An X-ray photoelectron spectroscopy study of the HF etching of native oxides on Ge(111) and Ge(100) surfaces
- 1 January 1998
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 123-124, 66-70
- https://doi.org/10.1016/s0169-4332(97)00511-4
Abstract
No abstract availableThis publication has 11 references indexed in Scilit:
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