High-density flat plasma production based on surface waves
- 1 May 1998
- journal article
- Published by IOP Publishing in Plasma Sources Science and Technology
- Vol. 7 (2) , 192-205
- https://doi.org/10.1088/0963-0252/7/2/014
Abstract
Recent development of large-diameter (>30 cm) high-density microwave plasma production at low pressures ( mTorr) without an external DC magnetic field is reviewed in view of application to the next generation ULSI devices and flat panel displays. Understanding the discharge physics - excitation, propagation and absorption of the surface wave in a flat plasma geometry under overdense conditions - is indispensable for controlling the plasma. Experimental evidence of discrete surface-wave modes is clearly found in optical emission and microwave field measurements. The analysis of the full-wave electromagnetic dispersion successfully identified the observed eigenmodes. Stability analysis of the wave-plasma interaction resulted in a stability criterion predicting hysteresis loops in the power-density dependence, which were found in the experiment. A possibility of collisionless absorption of surface waves, i.e. mode conversion to electron plasma waves at the resonant layer, is discussed with the recent experimental results taken into account. From the plasma technology point of view, examples of surface-wave plasma tools (some of them commercially available) are introduced and the significance of the antenna structure is emphasized. Finally, the advantages of the surface-wave plasma source in comparison with other high-density sources are summarized.Keywords
This publication has 29 references indexed in Scilit:
- Plasma sources using long linear microwave field applicators: main features, classification and modellingPlasma Sources Science and Technology, 1995
- Axial structure of low-pressure high-frequency discharges sustained by travelling electromagnetic surface wavesPhysics Reports, 1995
- Oxide Etching Using Surface Wave Coupled PlasmaJapanese Journal of Applied Physics, 1994
- Slot antenna 2.45 GHz microwave plasma sourcePlasma Sources Science and Technology, 1994
- Very Long and Large-Area RF Plasma Productions by Odd Surface Waves for Online Mass Production of Amorphous Silicon Solar Cells or MirrorsJapanese Journal of Applied Physics, 1994
- Affecting factors on surface-wave-produced plasmaJournal of Vacuum Science & Technology A, 1993
- Plasma sources based on the propagation of electromagnetic surface wavesJournal of Physics D: Applied Physics, 1991
- Resist stripping in an O2+H2O plasma downstreamJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1991
- Gegeneration of a Microwave Plasma Using Traveling WavesJournal of Microwave Power and Electromagnetic Energy, 1989
- Experimental investigations of the propagation of surface waves along a plasma columnPlasma Physics, 1982