Optical characteristics of sputtered tantalum oxynitride Ta(N,O) films
- 19 January 2002
- journal article
- Published by Elsevier in Materials Chemistry and Physics
- Vol. 74 (2) , 201-209
- https://doi.org/10.1016/s0254-0584(01)00467-9
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Characteristics of tantalum oxynitride films prepared by rf magnetron sputteringPublished by SPIE-Intl Soc Optical Eng ,2000
- Crystallographic and morphological characterization of reactively sputtered Ta, TaN and TaNO thin filmsThin Solid Films, 1997
- Study of nanocrystalline Ta(N,O) diffusion barriers for use in Cu metallizationMicroelectronic Engineering, 1997
- Properties of TaNx films as diffusion barriers in the thermally stable Cu/Si contact systemsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1996
- Stress-related effects in thin filmsThin Solid Films, 1989
- Thermal Oxidation of Sputtered TaN Films and Properties of the Oxidized FilmsJapanese Journal of Applied Physics, 1987
- The microstructure of sputter‐deposited coatingsJournal of Vacuum Science & Technology A, 1986
- Effects of Nitrogen, Methane, and Oxygen on Structure and Electrical Properties of Thin Tantalum FilmsJournal of Applied Physics, 1964