AlN and AlGaN growth using low-pressure metalorganic chemical vapor deposition
- 1 December 1998
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 195 (1-4) , 280-285
- https://doi.org/10.1016/s0022-0248(98)00668-x
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
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