Nanosecond double-frame electron microscopy of fast phase transitions
- 1 December 1989
- journal article
- Published by IOP Publishing in Journal of Physics E: Scientific Instruments
- Vol. 22 (12) , 1008-1011
- https://doi.org/10.1088/0022-3735/22/12/010
Abstract
A high-velocity technique, capable of producing for the first time multi-frame short exposure time images in the electron microscope, is introduced. It is based on an electron image detector, consisting of a successively pulsed multichannel plate, acting as a fast shutter and a high-gain image amplifier, followed by a scintillator on positive potential as image converter. A frame-shifting plate capacitor, installed above the projector lens, places the succeeding images on unexposed areas of the multichannel plate, thus avoiding the long recovery time (milliseconds) of fired areas. Exposure times of 10-50 ns and delays >or approximately=100 ns between the shots are realised. Successive stages of laser pulse-induced crystallisation and evaporation of amorphous films are visualised with this new method.Keywords
This publication has 7 references indexed in Scilit:
- Plasma x-ray source for lithography generated by a ≊30 J, 30 ns KrF laserApplied Physics Letters, 1988
- A laser-generated plasma source for x-ray lithography and VLSIJournal of Physics E: Scientific Instruments, 1988
- Nanosecond-exposure electron microscopy of laser-induced phase transformationsUltramicroscopy, 1987
- Producing high-current nanosecond electron pulses with a standard tungsten hairpin gunJournal of Physics E: Scientific Instruments, 1987
- Nanosecond transmission electron microscopy and diffractionJournal of Physics E: Scientific Instruments, 1987
- Evaluation of the gas puff z pinch as an x-ray lithography and microscopy sourceApplied Physics Letters, 1982
- Tracing fast phase transitions by electron microscopyPhysica Status Solidi (a), 1980