SIMOX: Buried layer formation by ion implantation — Equipment and techniques
- 1 February 1989
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 37-38, 512-517
- https://doi.org/10.1016/0168-583x(89)90235-8
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
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- A model for the formation of amorphous Si by ion bombardmentRadiation Effects, 1970