Structures and properties of chromium thin films prepared by anisotropic-emission-effect sputter deposition

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Abstract
Chromium thin films were prepared by a sputter-deposition system in which substrates were arranged semicircularly against a chromium target. Structures and compositions of the films were investigated by x-ray diffractometer, x-ray photoelectron spectroscopy, electron probe microanalyzer, and scanning electron microscope. It was found that oxygen content in the films was highest at the opposite side of the target and was lowest at the position of 60° or 75° off with respect to the target normal. At the latter position, (110)-preferred orientation and enlargement of the bcc chromium lattice were observed. Although cracks were generated in the films deposited at the opposite side of the target, no cracks were generated in the films deposited at the oblique direction. These results on the chromium films could be explained in terms of the bombardment effect by the reflected argon atoms whose energy was a function of the scattering angle.