Seeman-Bohlin X-ray diffraction study of Al-1 %Si thin films used in ULSI devices
- 1 March 1992
- journal article
- Published by Elsevier in Materials Letters
- Vol. 13 (2-3) , 142-146
- https://doi.org/10.1016/0167-577x(92)90126-5
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Structure and properties of Al-1%Si thin films on Si as a function of gas impurities during DC magnetron-sputtered depositionJournal of Electronic Materials, 1989
- Effect of the sputtering ambient contamination on the microstructure of Al–Si filmsJournal of Vacuum Science & Technology A, 1989
- Effect of texture and grain structure on electromigration in Al-0.5%Cu thin filmsThin Solid Films, 1981
- Seeman–Bohlin X-ray diffractometer for thin filmsJournal of Applied Crystallography, 1970