Low-temperature dry etching of tungsten, dielectric, and trilevel resist layers on GaAs
- 1 December 1994
- journal article
- research article
- Published by Springer Nature in Plasma Chemistry and Plasma Processing
- Vol. 14 (4) , 505-522
- https://doi.org/10.1007/bf01570209
Abstract
No abstract availableThis publication has 28 references indexed in Scilit:
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