Fluorinated compounds for advanced IC interconnect applications: a survey of chemistries and processes
- 1 July 2003
- journal article
- Published by Elsevier in Journal of Fluorine Chemistry
- Vol. 122 (1) , 87-92
- https://doi.org/10.1016/s0022-1139(03)00098-8
Abstract
No abstract availableKeywords
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