The threshold current density and incubation time to electromigration in gold films
- 1 October 1977
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 46 (2) , 139-150
- https://doi.org/10.1016/0040-6090(77)90056-6
Abstract
No abstract availableThis publication has 13 references indexed in Scilit:
- Electromigration in thin aluminum films on titanium nitrideJournal of Applied Physics, 1976
- Study of conductive gold film lifetime under high current densitiesJournal of Applied Physics, 1975
- Activation energy for electrotransport in thin silver and gold filmsThin Solid Films, 1975
- Electromigration in thin gold films on molybdenum surfacesThin Solid Films, 1975
- Electromigration of Ti–Au thin-film conductors at 180° CJournal of Applied Physics, 1974
- The activation energy for electromigration and grain-boundary self-diffusion in goldScripta Metallurgica, 1973
- Electromigration in thin gold filmsJournal of Physics F: Metal Physics, 1973
- Electromigration and crevice formation in thin metallic filmsThin Solid Films, 1972
- Electromigration-Induced Failures in, and Microstructure and Resistivity of, Sputtered Gold FilmsJournal of Applied Physics, 1972
- Current-induced marker motion in gold wiresJournal of Physics and Chemistry of Solids, 1961