Elastic constants and thermal expansion coefficient of metastable C49 TiSi2
- 15 March 1993
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 73 (6) , 2816-2820
- https://doi.org/10.1063/1.353058
Abstract
The elastic constants and thermal expansion coefficient of C49 TiSi2 thin films have been investigated by in situ curvature measurement during heat treatment and ex situ x-ray diffraction measurements. The C49 TiSi2 compound was formed from Ti-Si multilayers deposited on monocrystalline silicon and sapphire substrates. The films were polycrystalline without any evident texture. Young’s modulus (142 GPa), Poisson’s ratio (0.27), and the thermal expansion coefficient (10.9×10−6 K−1) have been determined. Note that these values are averages over random crystal orientations. Directly after formation C49 TiSi2 films exhibit tensile stress. This stress relaxes considerably above 375 °C. Below this temperature the thermal expansion is found to be independent of the state of relaxation of the C49 TiSi2 film.This publication has 16 references indexed in Scilit:
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