Hybrid Amorphous and Polycrystalline Silicon Devices for Large-Area Electronics
- 1 January 1998
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Laser dehydrogenation/crystallization of plasma-enhanced chemical vapor deposited amorphous silicon for hybrid thin film transistorsApplied Physics Letters, 1994
- An experimental study of the source/drain parasitic resistance effects in amorphous silicon thin film transistorsJournal of Applied Physics, 1992
- Pulsed laser-induced amorphization of silicon filmsJournal of Applied Physics, 1991
- A New Self-Aligned A-SI TFT Using Ion Doping and Chromium Silicide FormationMRS Proceedings, 1991
- On-Chip Bottom-Gate Polysilicon and Amorphous Silicon Thin-Film Transistors Using Excimer Laser AnnealingJapanese Journal of Applied Physics, 1990
- Amorphous Silicon Sensor Arrays for Radiation ImagingMRS Proceedings, 1990
- High-performance TFTs fabricated by XeCl excimer laser annealing of hydrogenated amorphous-silicon filmIEEE Transactions on Electron Devices, 1989