Ion bombardment effects in polymers
- 1 September 1986
- journal article
- research article
- Published by Taylor & Francis in Radiation Effects
- Vol. 98 (1-4) , 115-137
- https://doi.org/10.1080/00337578608206104
Abstract
Ion bombardment of organic materials produces dramatic changes in their properties associated with disruption and rearrangement of the original chemical bonding and formation of new molecular products. In polymers, bombardment results in cross linking and/or chain scission, gas evolution and eventual carbonization. In films of relatively non-volatile organic molecules ion bombardment can result in polymerization or in decomposition with metallic residue film formation. Intense laser radiation in polymers can lead to material ablation through explosive ejection processes. Similar explosive effects are implied by the results of ion beam irradiation of nitrocellulose. The status of the field of ion bombardment effects in organic materials is still in its infancy from the point of view of detailed understanding of the mechanisms involved. This article is a brief review of the diversity of effects being studied.Keywords
This publication has 18 references indexed in Scilit:
- Carbonized layer formation in ion implanted photoresist masksNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985
- Scattering of electromagnetic waves from a randomly perturbed quasiperiodic surfaceJournal of Applied Physics, 1984
- Experimental estimation of an optical disk system with V-shaped groovesApplied Physics Letters, 1983
- Introduction to MicrolithographyPublished by American Chemical Society (ACS) ,1983
- Ion beam lithographyNuclear Instruments and Methods in Physics Research, 1981
- Polymethyl methacrylate sensitivity variation versus the electronic stopping power at ion lithography exposureApplied Physics Letters, 1981
- Ion beam exposure characteristics of resistsJournal of Vacuum Science and Technology, 1979
- Crosslinking positive resist for deep UV photolithography and its application to LSI fabrication processesJournal of Vacuum Science and Technology, 1979
- Photochemical synthesis. 49. Thione photochemistry. 9. Mechanism of photocycloaddition of thiobenzophenone at 366 nmJournal of the American Chemical Society, 1973
- Epoxide-Containing Polymers as Highly Sensitive Electron-Beam ResistsJournal of the Electrochemical Society, 1971