Investigations of titanium oxide films deposited by d.c. reactive magnetron sputtering in different sputtering pressures
- 1 April 1993
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 226 (1) , 22-29
- https://doi.org/10.1016/0040-6090(93)90200-9
Abstract
No abstract availableKeywords
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