In situ investigation by IR ellipsometry of the growth and interfaces of amorphous silicon and related materials
- 1 October 1993
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 234 (1-2) , 363-366
- https://doi.org/10.1016/0040-6090(93)90286-x
Abstract
No abstract availableThis publication has 20 references indexed in Scilit:
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