Methodology for layout design and optimization of ESD protection transistors
- 24 August 2005
- conference paper
- Published by Institute of Electrical and Electronics Engineers (IEEE)
Abstract
A design methodology for multiple-fingered CMOS electrostatic discharge (ESD) protection transistors is presented. The methodology employs empirical modeling to predict the current-voltage (I-V) characteristics and ESD withstand level of a circuit given the circuit's layout parameters. Transmission-line pulsing (TLP) is used to characterize the transient I-V response of a set of test structures for a given process technology, with the results of this testing used to build the model. A key step in predicting human-body model (HBM) robustness is the correlation of TLP withstand current to HBM withstand voltage. Identification of an integrated circuit's potential ESD discharge paths is critical to accurate utilization of the model. Quantitative prediction is achieved for HBM withstand voltages of an SRAM circuit. Optimization of protection-transistor layout area for a given ESD withstand level is discussed.Keywords
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