Improving the ESD failure threshold of silicided n-MOS output transistors by ensuring uniform current flow
- 1 January 1992
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 39 (2) , 379-388
- https://doi.org/10.1109/16.121697
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
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