UV annealing of low temperature photodeposited SiO2 films with a new powerful lamp source
- 1 January 1992
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 54, 435-439
- https://doi.org/10.1016/0169-4332(92)90083-a
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
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