Fluorine-containing species on the hydrofluoric acid etched silicon single-crystal surface
- 15 January 1991
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 69 (2) , 803-807
- https://doi.org/10.1063/1.347367
Abstract
The chemical structure and property of fluorine-containing species on the hydrofluoric acid (HF) etched Si surface was examined by use of x-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy. The fluorine content on the surface was found to increase with increase of HF concentration. A silicon surface etched by 50% HF has fluorine of 2.6×1014 atoms/cm2 as Si–F. Most of the Si–F bondings are rapidly hydrolyzed to Si–OH by rinsing the wafer in water. Thus prepared Si–OH groups are found to be useful as active sites for chemical modification of the bare silicon single-crystal surface. The Si–F was observed not to influence the oxidation rate of HF etched silicon surface.This publication has 8 references indexed in Scilit:
- Control of the chemical reactivity of a silicon single-crystal surface using the chemical modification techniqueJournal of Applied Physics, 1990
- Reaction of water with hydrofluoric acid treated silicon(111) and (100) surfacesJournal of Vacuum Science & Technology A, 1989
- The formation of hydrogen passivated silicon single-crystal surfaces using ultraviolet cleaning and HF etchingJournal of Applied Physics, 1988
- Surface chemistry of HF passivated silicon: X-ray photoelectron and ion scattering spectroscopy resultsJournal of Applied Physics, 1986
- Investigations on hydrophilic and hydrophobic silicon (100) wafer surfaces by X-ray photoelectron and high-resolution electron energy loss-spectroscopyApplied Physics A, 1986
- Effect of organic contaminants on the oxidation kinetics of silicon at room temperatureApplied Physics Letters, 1986
- On the formation and structure of self-assembling monolayers. I. A comparative atr-wettability study of Langmuir—Blodgett and adsorbed films on flat substrates and glass microbeadsJournal of Colloid and Interface Science, 1984
- Synchrotron photoemission investigation: Fluorine on silicon surfacesApplied Physics Letters, 1984