Junction characteristics of Ga0.5In0.5P n+p diodes and solar cells
- 1 June 1995
- journal article
- conference paper
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 77 (11) , 5763-5772
- https://doi.org/10.1063/1.359221
Abstract
Forward and reverse bias dark current characteristics of n+p mesa diodes and solar cells fabricated from metalorganic chemical vapor deposition grown Ga0.5In0.5P have been examined, and dark current behavior has been correlated with Ga0.5In0.5P solar cell conversion efficiency. Dependencies of dominant dark currents on voltage, temperature, and doping density were found to be consistent with recombination theory. Recombination dark current with an ideality factor of A=1.9–2.1 was dominant in the voltage range of ∼0.5 to 1.5 V and ∼0.8 to 1.2 V for devices with a p‐base doping density of ∼1016 and 1017 cm−3, respectively. Reverse current‐voltage‐temperature measurements identified two dominant deep levels at 0.10 and ∼0.45 eV relative to either the valence‐ or conduction‐band minimum. The carrier recombination was found to occur through these deep level centers in the n+p junction.This publication has 29 references indexed in Scilit:
- Gas source molecular beam epitaxial growth and characterization of 600–660 nm GaInP/AlInP double-heterostructure lasersThin Solid Films, 1993
- Gas-source molecular beam epitaxial growth, characterization, and light-emitting diode application of InxGa1−xP on GaP(100)Applied Physics Letters, 1993
- Microwave performance of a self-aligned GaInP/GaAs heterojunction bipolar transistorIEEE Electron Device Letters, 1993
- Disorder/order/disorder Ga0.5In0.5P visible light-emitting diodesJournal of Applied Physics, 1992
- Near-ideal I-V characteristics of GaInP/GaAs heterojunction bipolar transistorsIEEE Electron Device Letters, 1992
- Electrical and structural properties of Ga0.51In0.49P/GaAs heterojunctions grown by metalorganic vapor-phase epitaxyApplied Physics Letters, 1992
- Remarkable reduction of threshold current density by substrate misorientation effects in 660 nm visible light lasers with GaInP bulk active layersApplied Physics Letters, 1992
- High performance of AlGaInP/GaInP visible lasers by strain induced effectsElectronics Letters, 1991
- High-efficiency InGaP light-emitting diodes on GaP substratesApplied Physics Letters, 1991
- Band lineup for a GaInP/GaAs heterojunction measured by a high-gain N p n heterojunction bipolar transistor grown by metalorganic chemical vapor depositionJournal of Applied Physics, 1989