Thermal oxidation of the silicides CoSi2, CrSi2, NiSi2, PtSi, TiSi2 and ZrSi2
- 1 September 1985
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 131 (3-4) , 215-231
- https://doi.org/10.1016/0040-6090(85)90142-7
Abstract
No abstract availableThis publication has 25 references indexed in Scilit:
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