Control of the buried SiO2 layer thickness and Si defect density in SIMOX substrates — structural investigation and process optimisation
- 1 April 1993
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 74 (1) , 197-203
- https://doi.org/10.1016/0168-583x(93)95042-4
Abstract
No abstract availableKeywords
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