Oxidation behavior of titanium-aluminium nitrides
- 1 December 1995
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 76-77, 499-507
- https://doi.org/10.1016/0257-8972(95)02566-9
Abstract
No abstract availableKeywords
This publication has 21 references indexed in Scilit:
- (Ti1−xAlx)N coatings by plasma-enhanced chemical vapor depositionJournal of Vacuum Science & Technology A, 1994
- Quantitative analysis of titanium nitride by auger electron spectroscopyThin Solid Films, 1990
- Oxidation behavior of CrNx and (Cr,Al)Nx hard coatingsMaterials and Corrosion, 1990
- Oxidation of metastable single-phase polycrystalline Ti0.5Al0.5N films: Kinetics and mechanismsJournal of Applied Physics, 1990
- Interrelationship between processing, coatingproperties and functional properties of steered arc physically vapour deposited (Ti,AI)N and (Ti,Nb)N coatingsThin Solid Films, 1990
- Selective oxidation and chemical state of Al and Ti in (Ti, Al)n coatingsSurface and Interface Analysis, 1988
- Structure and composition of ZrN and (Ti,Al)N coatingsJournal of Vacuum Science & Technology A, 1988
- Deposition and characterization of ternary nitridesJournal of Vacuum Science & Technology A, 1988
- Thermal Oxidation of Reactively Sputtered Titanium Nitride and Hafnium Nitride FilmsJournal of the Electrochemical Society, 1983
- Oxidation Behavior of Chromium Between 300° and 600°CJournal of the Electrochemical Society, 1977