Self organized defect free InAs/GaAs and InAs/InGaAs/GaAs quantum dots with high lateral density grown by MOCVD
- 1 January 1998
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 123-124, 725-728
- https://doi.org/10.1016/s0169-4332(97)00476-5
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Room-temperature continuous-wave lasing from stacked InAs/GaAs quantum dots grown by metalorganic chemical vapor depositionApplied Physics Letters, 1997
- InAs/GaAs Quantum Dots Grown by Metalorganic Chemical Vapor DepositionJapanese Journal of Applied Physics, 1997
- Structural and optical properties of InAs–GaAs quantum dots subjected to high temperature annealingApplied Physics Letters, 1996
- Room temperature CW operation at the ground stateof self-formed quantum dot lasers with multi-stacked dot layerElectronics Letters, 1996
- Effects of interdiffusion on the luminescence of InGaAs/GaAs quantum dotsApplied Physics Letters, 1996
- Direct formation of vertically coupled quantum dots in Stranski-Krastanow growthPhysical Review B, 1996
- Room temperature lasing from InGaAs quantum dotsElectronics Letters, 1996
- Room-temperature operation of In 0.4 Ga 0.6 As/GaAsself-organised quantum dot lasersElectronics Letters, 1996
- Self-organization processes of InGaAs/GaAs quantum dots grown by metalorganic chemical vapor depositionApplied Physics Letters, 1996
- Low threshold, large
T
o
injectionlaser emissionfrom (InGa)As quantum dotsElectronics Letters, 1994