50 GHz Si1 − xGex heterobipolar transistor: growth of the complete layer sequence by molecular beam epitaxy
- 1 December 1992
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 222 (1-2) , 137-140
- https://doi.org/10.1016/0040-6090(92)90054-f
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- The influence of MBE-layer design on the high frequency performance of Si/SiGe HBTsMicroelectronic Engineering, 1992
- MBE-grown Si/SiGe HBTs with high beta , f/sub T/, and f/sub max/IEEE Electron Device Letters, 1992
- High-speed double mesa Si/SiGe heterojunction bipolar transistor fabricated by selfalignment technologyElectronics Letters, 1992
- 75-GHz f/sub T/ SiGe-base heterojunction bipolar transistorsIEEE Electron Device Letters, 1990
- Boron doping of SiGe base of heterobipolar transistorsThin Solid Films, 1990
- An Industrial Single‐Slice Si‐MBE ApparatusJournal of the Electrochemical Society, 1989
- Growth and properties of Si/SiGe superlatticesSurface Science, 1986
- High Speed Integrated Circuit Using Silicon Molecular Beam Epitaxy (Si‐MBE)Journal of the Electrochemical Society, 1985