Integration of self-assembled diblock copolymers for semiconductor capacitor fabrication
Top Cited Papers
- 16 July 2001
- journal article
- conference paper
- Published by AIP Publishing in Applied Physics Letters
- Vol. 79 (3) , 409-411
- https://doi.org/10.1063/1.1383805
Abstract
We combine a self-organizing diblock copolymer system with semiconductor processing to produce silicon capacitors with increased charge storage capacity over planar structures. Our process uses a diblock copolymer thin film as a mask for dry etching to roughen a silicon surface on a 30 nm length scale, which is well below photolithographic resolution limits. Electron microscopy correlates measured capacitance values with silicon etch depth, and the data agree well with a geometric estimate. This block copolymer nanotemplating process is compatible with standard semiconductor processing techniques and is scalable to large wafer dimensions.Keywords
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