Two-dimensional modeling of electron cyclotron resonance plasma production
- 1 October 1992
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 72 (7) , 2652-2658
- https://doi.org/10.1063/1.351566
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
- A simple and efficient microwave launcher for plasma productionPlasma Sources Science and Technology, 1992
- Local Structure of ECR Process PlasmaJapanese Journal of Applied Physics, 1990
- Extremely high selective, highly anisotropic, and high rate electron cyclotron resonance plasma etching for n+ poly-Si at the electron cyclotron resonance positionJournal of Vacuum Science & Technology B, 1990
- Two-dimensional simulations of rf glow discharges inandPhysical Review A, 1990
- A two-dimensional model of dc glow dischargesJournal of Applied Physics, 1988
- Numerical model of rf glow dischargesPhysical Review A, 1987